Park NX-HDM

Identifying nanoscale defects is a very time consuming process for engineers working with media and flat substrates.
Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning, and analysis. It links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput. With its industry's lowest noise floor, and its unique True Non-Contact™ technology, the Park NX-HDM is the most accurate AFM for surface roughness measurement on the market.